National Repository of Grey Literature 2 records found  Search took 0.00 seconds. 
The contrast curves determination for e-beam writer with Gaussian beam
Šuľan, Dušan ; Horáček,, Miroslav (referee) ; Krátký, Stanislav (advisor)
This work deals with technological process of structures creating by using of electron beam lithography. The main focus of the work is contrast curves of PMMA resist determination for electron beam lithography system Vistec EBPG 5000+ ES. Contrast curves are determined for different developers, developing times and the depths of resist. Sensitivity and the contrast of resist are determined from these contrast curves for each resist-developer system. Sensitivity curves are applied to the proximity effect correction on real structures, specifically the periodic diffraction gratings and then they are evaluated.
The contrast curves determination for e-beam writer with Gaussian beam
Šuľan, Dušan ; Horáček,, Miroslav (referee) ; Krátký, Stanislav (advisor)
This work deals with technological process of structures creating by using of electron beam lithography. The main focus of the work is contrast curves of PMMA resist determination for electron beam lithography system Vistec EBPG 5000+ ES. Contrast curves are determined for different developers, developing times and the depths of resist. Sensitivity and the contrast of resist are determined from these contrast curves for each resist-developer system. Sensitivity curves are applied to the proximity effect correction on real structures, specifically the periodic diffraction gratings and then they are evaluated.

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